TAMPON DE POLISSAGE EN MOUSSE DURE MAKITA T-02674, 5-1/2 PO DE CHARGE, 7/8 PO THK

High-quality foam pads ideal for professional applications

Partially closed cells are strategically patterned to drastically improve polishing performance by evenly dispersing compound/polishing onto the working surface

Slower rate of polish absorption enhances polishing performance

Reduced surface tension allows operator to run pad flat on the working surface with greatly minimized pad skipping

CCS pockets gradually release compound/polish as required, resulting in increased operator control

Reduced surface contact generates less friction and heat

Curved edges enable easier polishing in corners and along edges

Hook and loop backing

Machine wash in warm water and air dry to clean